Back

ISO/TR 15969:2021

Surface chemical analysis — Depth profiling — Measurement of sputtered depth

General information
Valid from 17.03.2021
Directives or regulations
None
Standard history
Status
Date
Type
Name
17.03.2021
Main
31.05.2001
Main
This document provides guidelines for measuring the sputtered depth in sputtered depth profiling.  The methods of sputtered depth measurement described in this document are applicable to techniques of surface chemical analysis when used in combination with ion bombardment for the removal of a part of a solid sample to a typical sputtered depth of up to several micrometres. The depth typically determined by this approach is between 1 nm to 500 µm.
*
*
*
PDF
97.78 € incl tax
Paper
97.78 € incl tax
Standard monitoring