Tagasi

IEC 63229:2021

Semiconductor devices - Classification of defects in gallium nitride epitaxial film on silicon carbide substrate

Üldinfo
Kehtiv alates 07.04.2021
Tegevusala (ICS grupid)
31.080.99 Muud pooljuhtseadised
Direktiivid või määrused
puuduvad

Standardi ajalugu

Staatus
Kuupäev
Tüüp
Nimetus
07.04.2021
Põhitekst
IEC 63229:2021(E) gives guidelines for the definition and classification of defects in GaN epitaxial film grown on SiC substrate. They are identified and described on the basis of examples, mainly by schematic illustrations, optical microscope images, and transmission electron microscope images for these defects. This document covers only defects in as-grown GaN epitaxial film on SiC substrate and does not include defects caused by subsequent processes.
*
*
*
PDF
196,66 € koos KM-ga
Paber
196,66 € koos KM-ga
Standardi monitooring