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ISO 21466:2019

Microbeam analysis -- Scanning electron microscopy -- Method for evaluating critical dimensions by CD-SEM

Üldinfo
Kehtiv alates 13.12.2019
Tegevusala (ICS grupid)
37.020 Optikaseadmed
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puuduvad
Standardi ajalugu
Staatus
Kuupäev
Tüüp
Nimetus
13.12.2019
Põhitekst
This document specifies the structure model with related parameters, file format and fitting procedure for characterizing critical dimension (CD) values for wafer and photomask by imaging with a critical dimension scanning electron microscope (CD-SEM) by the model-based library (MBL) method. The method is applicable to linewidth determination for specimen, such as, gate on wafer, photomask, single isolated or dense line feature pattern down to size of 10 nm.
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