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ISO/TR 15969:2021

Surface chemical analysis — Depth profiling — Measurement of sputtered depth

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Kehtiv alates 17.03.2021
Tegevusala (ICS grupid)
71.040.40 Keemiline analüüs
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Standardi ajalugu
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Kuupäev
Tüüp
Nimetus
17.03.2021
Põhitekst
31.05.2001
Põhitekst
This document provides guidelines for measuring the sputtered depth in sputtered depth profiling.  The methods of sputtered depth measurement described in this document are applicable to techniques of surface chemical analysis when used in combination with ion bombardment for the removal of a part of a solid sample to a typical sputtered depth of up to several micrometres. The depth typically determined by this approach is between 1 nm to 500 µm.
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