Back

IEC 63229:2021

Semiconductor devices - Classification of defects in gallium nitride epitaxial film on silicon carbide substrate

General information
Valid from 07.04.2021
Directives or regulations
None
Standard history
Status
Date
Type
Name
07.04.2021
Main
IEC 63229:2021(E) gives guidelines for the definition and classification of defects in GaN epitaxial film grown on SiC substrate. They are identified and described on the basis of examples, mainly by schematic illustrations, optical microscope images, and transmission electron microscope images for these defects. This document covers only defects in as-grown GaN epitaxial film on SiC substrate and does not include defects caused by subsequent processes.
*
*
*
PDF
161.11 € incl tax
Paper
161.11 € incl tax
Standard monitoring