Tagasi

EVS-EN 62047-21:2014

Semiconductor devices - Micro-electromechanical devices - Part 21: Test method for Poisson's ratio of thin film MEMS materials

Üldinfo
Kehtiv alates 07.11.2014
Alusdokumendid
EN 62047-21:2014; IEC 62047-21:2014
Tegevusala (ICS grupid)
31.080 Pooljuhtseadised
Direktiivid või määrused
puuduvad
Standardi ajalugu
Staatus
Kuupäev
Tüüp
Nimetus
07.11.2014
Põhitekst
IEC 62047-21:2014 specifies the determination of Poisson's ratio from the test results obtained by the application of uniaxial and biaxial loads to thin-film micro-electromechanical systems (MEMS) materials with lengths and widths less than 10 mm and thicknesses less than 10 µm.
*
*
*
PDF
10,46 € koos KM-ga
Paber
10,46 € koos KM-ga
Hind: 2,40 € koos KM-ga
Standardi monitooring
Teised on ostnud veel
Põhitekst

EVS-EN 62047-26:2016

Semiconductor devices - Micro-electromechanical devices - Part 26: Description and measurement methods for micro trench and needle structures
Uusim versioon Kehtiv alates 03.05.2016
Põhitekst

EVS-EN 62047-25:2016

Semiconductor devices - Micro-electromechanical devices - Part 25: Silicon based MEMS fabrication technology - Measurement method of pull-press and shearing strength of micro bonding area
Uusim versioon Kehtiv alates 06.12.2016
Põhitekst

EVS-EN 62047-22:2014

Semiconductor devices - Micro-electromechanical devices - Part 22: Electromechanical tensile test method for conductive thin films on flexible substrates
Uusim versioon Kehtiv alates 07.11.2014
Muudatus

EVS-EN 60747-16-4:2004/A2:2017

Semiconductor devices - Part 16-4: Microwave integrated circuits - Switches
Uusim versioon Kehtiv alates 01.12.2017