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EVS-EN 62374-1:2010

Semiconductor devices - Part 1: Time-dependent dielectric breakdown (TDDB) test for inter-metal layers

General information
Valid from 05.01.2011
Base Documents
IEC 62374-1:2010; EN 62374-1:2010
Directives or regulations
None
Standard history
Status
Date
Type
Name
04.05.2011
Corrigendum
05.01.2011
Main
This part of IEC 62374 describes a test method, test structure and lifetime estimation method of the time-dependent dielectric breakdown (TDDB) test for inter-metal layers applied in semiconductor devices.
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